Annealing Furnace is a process used in semiconductor device fabrication which consist of heating multiple semiconductor wafers in order to affect their electrical properties. Heat treatments are designed for different effects. Annealing Furnaces may be integrated into other furnace processing steps, such as oxidations, or may be processed on their own. Furnace anneals are performed by equipment especially built to heat semiconductor wafers. Furnaces are capable of processing lots of wafers at a time but each process can last between several hours and a day.
Annealing Furance designs can be stationary, moving or continous, are a few examples. Annealing is applied to both ferrous and non-ferrous metals, and is intended to reduce the strength and hardness of the product while increasing the ductility. Annealing Furnace features heating elements in ceramic fibre insulation, providing a maximum temperature of 1100°C in the furnace’s vacuum tight chamber.
Features of Annealing Furnace
An Annealing Furnace is a piece of equipment used to heat a material at very high temperatures, to change its hardness and strength properties. Annealing is commonly associated with the manufacture of steel, to relieve internal stresses that may lead to failure in service and to produce a more uniform, or homogeneous, internal structure. 1200°C degree 1600°C degree metal or ceramics heat treatment furnace Annealing Furnace is welded by steel and profiled steel; furnace chamber is ceramic fiber and high quality electric resistance wire/SiC heaters, which can save 40% energy than brick furnace chamber. Car Bottom Furnace is mainly used for annealing, normalizing and stress relieving of bars and tubes, forgings, large weldments and castings.
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